Photolitografy

Author: Zurab Kushitashvili
Keywords: Ultraviolet, photoresist
Annotation:

In the modern world to create and produce high quality micro and nanosize devices impossible without photolithograpy. Using this technique can be obtained 10 nm features. Photolithograpy is an important direction of technological cycle, which has the big potential of development. Reducing the size of features is a object of research of production companies and scientific world.